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Plasma Science & Semiconductor Manufacture

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Finding the One Solution for Multiscale Multiphysics Modeling in Wafer ProcessingFinding the One Solution for Multiscale Multiphysics Modeling in Wafer Processing

TEL Technology Center, Albany, NY
Semiconductor wafer manufacturing involves a number of processes, ranging in size from nanometers to meters. This, along with coupling the physics of chemical...

Modeling a Copper-deposition SystemModeling a Copper-deposition System

Replisaurus Technologies AB, Kista, Sweden
Only through advanced packaging techniques can we take advantage of state-of-the-art microelectronic devices. The flip-chip method has become a cost-effective...

Example Models

Boat Reactor for Low Pressure Chemical Vapor DepositionBoat Reactor for Low Pressure Chemical Vapor Deposition

Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One of the common applications is the deposition of silicon on wafers at low pressure. Low pressure reactors are used to get a high...

Friction Stir Welding of an Aluminum PlateFriction Stir Welding of an Aluminum Plate

In friction stir welding, a rotating tool moves along the weld joint and melts the aluminum through the generation of friction heat. The tool’s rotation stirs the melted aluminum such that the two plates are joined. In this model,...

Chemical Vapor Deposition of GaAsChemical Vapor Deposition of GaAs

Chemical vapor deposition (CVD) allows a thin film to be grown on a substrate through molecules and molecular fragments adsorbing and reacting on a surface. This example illustrates the modeling of such a CVD reactor where...

Argon Boltzmann AnalysisArgon Boltzmann Analysis

This tutorial model investigates the effects of various parameters on the electron energy distribution function and rate coefficients for an argon discharge.

Dielectric Barrier DischargeDielectric Barrier Discharge

This model simulates electrical breakdown in an atmospheric pressure gas. Because electrical breakdown is a complicated process, a 1D model is considered. To highlight the physics of the breakdown process, the model uses a simple argon...

GEC ICP Reactor, Argon ChemistryGEC ICP Reactor, Argon Chemistry

This model investigates the electrical characteristics of the GEC reference cell for argon chemistry.

Thermal PlasmaThermal Plasma

This model of a high density inductively coupled plasma at 1 torr computes the neutral gas temperature and flow field as well as all the other components which make up the plasma. Gas heating occurs due to quenching of excited Argon atoms.

3D Model of an ICP Reactor3D Model of an ICP Reactor

This model investigates 3D effects for an inductively coupled plasma. Asymmetry in the pressure field leads to non-uniform fluxes to the wafer surface.

Inplane Microwave PlasmaInplane Microwave Plasma

This model uses an analytic port to send a plane wave into a reactor containing low pressure Argon. The wave is partially absorbed and reflected by the plasma which sustains the plasma.